Ceramic targets are relatively brittle targets. Usually ceramic targets are bound to a backing plate for use. In addition to supporting the ceramic target during the sputtering process, the backing plate can also play a role in heat transfer during the sputtering process. There are many types of ceramic targets with a wide range of applications. They are mainly used in the field of microelectronics, displays, storage and other fields. As a basic material for the development of the non-metallic film industry, ceramic targets have achieved unprecedented development.
Types of ceramic targets and their respective applications
According to application, it can be divided into semiconductor-related ceramic targets, display ceramic targets, magnetic recording ceramic targets, optical recording ceramic targets, superconducting ceramic targets, giant magnetoresistance ceramic targets, etc.
Semiconductor-related ceramic targets (HfO, SiO, Si3N4, MoSi, TaSi, WSi, TiSi, PLZT, ITO) are mainly used in gate dielectric films, dielectric films, diffusion barrier films, capacitor insulating films, and transparent conductive films;
Display ceramic target ZnS-Mn, ZnS-Tb, ZnS-Sm, CaS-Eu, SrS-Ce, Si3N4, MgO, mainly used in electroluminescent thin film light-emitting layer, electroluminescent thin film insulating layer
Magnetic recording ceramic target Si3N4 is mainly used for magnetic head and magneto-optical disk (MO) protection;
Optical recording ceramic rake material Si3N4, mainly used in optical disc protective films;
Superconducting ceramic targets YbaCuO, BiSrCaCuO, mainly used in superconducting thin films;
Giant magnetoresistance ceramic target, mainly used in thin film solar cell windows;
Other application targets InO, LiNbO, BaTiO, PZT. ZnO, mainly used in solar cells, piezoelectric films
According to chemical composition, it can be divided into oxide ceramic targets, silicide ceramic targets, nitride ceramic targets, fluoride ceramic targets and sulfide ceramic targets. Among them, flat display ITO ceramic targets have been widely produced and used in China. .Ceramic targets for high dielectric insulating films and giant magnetoresistance ceramic targets have broad application prospects.
Example: Oxide ceramic sputtering targets are the most common targets among advanced ceramic sputtering targets. Oxide ceramics can be made by sintering at high temperatures with one or more oxides as the main principal component and other minor oxides as additives. They are divided into simple oxide ceramics and complex oxide ceramics. Common sputtering targets of this type include aluminum oxide (Al2O3), magnesium oxide (MgO), beryllium oxide (BeO), zirconium oxide (ZrO2), etc. Most oxide ceramics have high melting points, excellent insulation, thermal strength, and antioxidant and corrosion resistance. Therefore, they can be exposed to high temperatures and oxidizing environments for long periods of time and are worthy of wide application in engineering fields.
